Skyspring Nanomaterials上海代理
Skysprin上海代理 ： SkySpring Nanomaterials是一家通過ISO 9001認(rèn)證的納米顆粒，納米粉末，微米粉末和CNT（碳納米管）的小批量供應(yīng)商，供研究和批量訂購。
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創(chuàng)亞化工（上海）有限公司是一家致力于生命科學(xué)和生物技術(shù)領(lǐng)域的高科技企業(yè)。公司由在國內(nèi)科研試劑領(lǐng)域有著十幾年從業(yè)經(jīng)驗(yàn)的專業(yè)技術(shù)團(tuán)隊(duì)和企業(yè)管理團(tuán)隊(duì)組建而成，專門從事以抗體、細(xì)胞因子、免疫檢測(cè)試劑盒等免疫學(xué)產(chǎn)品為主的生物試劑的研發(fā)與銷售。
Skyspring Nanomaterials上海代理*Beckman A63881的磁珠 現(xiàn)貨，moltox 11-101.5等現(xiàn)貨，transgenomic 706020/706025現(xiàn)貨，Megazyme的大部分現(xiàn)貨，LIST現(xiàn)貨，、ALZET大量現(xiàn)貨，
Skyspring Nanomaterials上海代理Avanti 、tedpella 、BioLegend、Polyplus、jena bioscience、Mattek、MRC-Holland、polysciences、enzo、novus、TOCRIS、CAYMAN、Neuro Probe、cyguns、eylabs、NIBSC、chondrex、lc laboratories、BTI、etonbio
Skyspring Nanomaterials上海代理
：楊旖
：15021505715 021-61525262
:chuangyabio
經(jīng)銷商:
終端:
Skyspring Nanomaterials上海代理
0115CY Ag, 99.95%, 100nm 0118XH Ag, 99.95%, 20-30nm 0120XH Ag, 99.95%, 20-30nm, PVP coated 0121XH Ag, 99.9%, 50-60nm 0123NJ Ag, 99.99%, 30-50nm, oleic acid coated 0124DX Ag, 99.9%, 200-400nm 0125DX Ag, 99.9%, 500-800 nm 0127SH Ag, 99.99%, 15nm, 25wt%, self-dispersible 0129HN Ag, nanowires
0200SJ Al, 99.9%, 18nm 0220XH Al, 99.7%, 40-60nm 0221XH Al, 99.7%, 60-80nm 0226XH Al, 99.7%, 100~130nm 0230HJ Al, 98%, 1~2um 0231NG Al, 99%, 1um, Spherical 0232NG Al, 99%, 2um, Spherical 0233NG Al, 99%, 5um, Spherical 0271DX Al-Si, 1~2um 0272DX Al-Si, 4~5um 0310DX Au, 99.99%, 50-100nm 0311DX Au, 99.9%, 20nm 0400BZ B, 99.9999% 0401BZ B, 99.999% 0402BZ B, 99.99% 0403BZ B, 99.9% 0410DX B, 99.9%, <100nm 0470DX Bi, 99.9%, <100nm 0480DX Bi, 99.0+%, -325 mesh 0490DX Bi, 99%, <25um 0510HZ Diamond, 95%, 3-4nm 0511HZ Diamond, 93%, 3-4nm 0512HZ Diamond, 55-75 %, 4-15nm 0520BX Graphite, 93%, 3-4nm 0522DX Graphite, 95%, <100nm 0521QZ Graphite, natural flake, 99%, 1um 0540DX Graphene Nanopowder (1-5 nm) 0541DX Graphene Nanopowder (6-8 nm) 0544DX Graphene Nanopowder (11-15 nm) 0530HT Super Activated Carbon, 100nm 0539DX Carbon Powder,99.99% 0610SJ Co, 99.8%, 25-30nm 0617SJ Co, C coated, 25~30nm 0721XH Cr, 99.7%, 60-80nm 0731DX Cr, 99.5%, ~5um 0851HN Cu, 5-7nm, dispersion, oil soluble 0800SJ Cu, 99.8%, 25nm 0820XH Cu, 99.9%, 40-60nm 0821XH Cu, 99.9%, 60-80nm 0824XH Cu, 99.9%, 100~130nm 0811DX Cu, 99.5%, 300nm 0810DX Cu, 99.8%, 500nm 0809NG Cu, 99.8%, 1um 0881NW Cu nanowires, 150nm immersed in ethanol 0882NW Cu nanowires, 300nm 0883NW Cu nanowires, 300nm immersed in ethanol 0915SJ Fe, 99.9%, 25nm 0922XH Fe, 99.7+%, 40-60nm 0923XH Fe, 99.7+%, 60-80nm 0924XH Fe, 99.7+%, 100~130nm 0961XH Stainless Steel 316L, 60-80nm 0990JH Carbonyl-Fe, micro-sized 3606DX Ge, 99.8+%, <200 nm 9120XH Mo, 99.7%, 40-60nm 9121XH Mo, 99.7%, 60-80nm 9130CN Mo, 99.9%, 0.5-0.8um 9213SG Ni, 99.9%, 1.0-1.5um 9225SJ Ni, 99.9%, 20nm 9227SJ Ni coated with carbon, 99.9%, 20nm 9220XH Ni, 99.7%, 40-60nm 9221XH Ni, 99.7%, 60-80nm 9210NG Ni, 99.9%, 500nm 9211NG Ni, 99.9%, 180nm 9215XH Ni, 99.8%, 80~150nm 9216NG Ni, 99.9%, 300nm 9230DX Ni, 99.9%, -325mesh 9290JH Carbonyl-Ni, 2-3um 9291DX Carbonyl-Ni, 4-7um 9293JH Carbonyl-Ni-Al (Ni Shell, Al Core) 9295JH Carbonyl-Ni-Fe Alloy 9410DX Pt, 99.9%, 200nm 9712HK Si, 99%, 100nm 9715DX Si, 99.9%, 500nm 9717HK Si, 99%, 30nm 9717DX Si, 99%, 50nm 9718DX Si, 99.999%, -325mesh 9719DX Si, 99.9+%, -200/+325 mesh 9720DG Si, Polycrystalline, 99.99995%, lumps 1021XH Sn, 99.7%, <100nm 1110XH Ta, 99.7%, 60-80nm 1123XH Ti, 99.9%, 40-60nm 1124XH Ti, 99.9%, 60-80nm 1126XH Ti, 99.9%, 40~60nm, PVP coated 1131DX Ti, 99.5%, ~6um 9820XH W, 99.7%, 40-60nm 9821XH W, 99.7%, 80-100nm 9920XH Zn, 99.7%, 40-60nm 9921XH Zn, 99.7%, 80-100nm 9990DX Zn, 99.9%, -325mesh | 1315TB AlOOH, 10-20nm, 99.99% 1319NH Al2O3 alpha, 99.0%, 40nm 1318DL Al2O3 alpha, 99.999%, 0.5-10um 1317NH Al2O3 alpha, 99.0%, 150nm 1320DL Al2O3 alpha, 99.9%, 50nm 1329DX Al2O3 alpha, 99.85%, 90~150nm 1321DL Al2O3 alpha, 99.99%, 0.3-0.8um 1324DL Al2O3 alpha, 99.99%, 3.5-15um 1328QI Al2O3 gamma, 99.9%, 5nm 1330DL Al2O3 gamma, 99.9%, 20nm 1331DL Al2O3 gamma, 99.9%, 0.4-1.5um 1338GJ Al2O3 Alpha, 99.999%, 5~8um 1340DL Al2O3, alpha, 99%, <100nm, hydrophobic coating 1340DX Aluminum Zinc Oxide Micropowder 1341DL Al(OH)3, 99.99%, 30-100nm 1342DL Al(OH)3, 99.99%, 2-10um 1360HK AlN, 99%, 40nm 1366HM Al(NO3)3, -325mesh 1401GC BaTiO3, 99.9%, 100nm 1520DX B2O3, 99.5%, 80nm 1531DX B2O3, 98%, - 200mesh 1522DX BN, 99.5+%, 100nm 1526BZ BN, 99.99%, 3-4um 1527BZ BN, 99.9%, 3-4um 1540HK B4C, 99+%, 50nm 1710CY Bi2O3, 99.9%, <200nm 1712DX Bi2O3, 99.9%, 5~20um 1950RH CaCO3, 97.5%, 15-40nm, paste 1951RH CaCO3, 97.5%, 15-40nm 1952RH CaCO3, 15-40nm, surface modified for water-based latex paint 1953RH CaCO3, 15-40nm, surface modified for plastic, PE/PP 1954RH CaCO3, 15-40nm, surface modified for plastic, PVC 1955RH CaCO3, 15-40nm, surface modified for printing inks 1956RH CaCO3, 15-40nm, surface modified for rubber 1957RH CaCO3, 15-40nm, surface modified for adhesives 1970NE Ca10(PO4)6(OH)2, 98.5%, 40nm 2110CG CeO2, 99.9%, 10-30nm 2113CG CeO2, 99.9%, 0.1-1.0um 2115DX CeO2, 99.9%, 1.0~3.0um 2118CG CeO2, 99.9%, ~5um 2161DX CeO2 doped with 10mol% Gd2O3, <100nm 2310SC CoO, <100nm 2320SC Co2O3, <100nm 2330SC Co3O4, 50nm 2510DX CsNO3, 99.9% 2511DX CsOH, 99.9% 2512DX CsOH, 50% Solution 2513DX Cs2CO3, 99.9% 2514DX CsF, 99.9% 2515DX CsI, 99.99% 2516DX CsCOOH, 80% Solution 2518DX CsCl, 99.9% 2519DX Cs2SO4, 99.95% 2520DX Cs2SO4, 50% Solution 2810NH CuO, 99+%, 40nm 2910DX Dy2O3, 99.9+%, 50nm 3010DX Er2O3, 99.9%, 40-50nm 3011DX Er2O3, 99.9%, 10um 3013DX Er2O3, 99.9%, 1um 3015DX Er2O3, 99.5%, 200 mesh 3110DX Eu2O3, 99.99%, 50nm 3111DX Eu2O3, 99.9%, 2-3um 3310DX Fe2O3 alpha, 99%, 20-40nm 3315DX Fe2O3 gamma, 99%, 20-40nm 3320DX Fe3O4, 98+%, 20-30nm 3510CG Gd2O3, 99.9%, <100nm 3590DX Gd2O3, 99.9% 3810XX HfO2, 99.9%, 100nm 3912DX Ho2O3, 99.9% 4110CB ITO, In2O3:SnO2=90:10, 20-70nm, yellow 4111CB ITO, In2O3:SnO2=95:5, 20-70nm, yellow 4112CB ITO, In2O3:SnO2=90:10, 20-70nm, blue 4113CB ITO, In2O3:SnO2=95:5, 20-70nm, blue 4115CB In2O3, 99.99%, 20-70nm 4116DX In2O3, 99.999% 4430DX LaB6, 99.0%, 50-80nm 4410CG La2O3, 99.99%, 100nm 4411CG La2O3, 99.9%, 0.3-0.5 micron 4441CG La2O3, 99.9% 4631HS LiCO2, 99.5%, ~5um 4632HS LiCO2, 99.5%, ~10um
| 4800DL MgO, 99.9%, 10-30nm 4810NH MgO, 99%, 20nm 4801DL MgO, 99.9%, 10-30nm, treated with Stearic Acid 4804DL MgO, 99.5%, <50um 4832SS Mg(OH)2, 99.8%, 50nm 4910DX Mn2O3, 98+%, 40-60nm 4930DX MnO2, 99+%, 5um 4950DX MnCl2, 99+%, 5um 5010DX MoO3, 99.5%, <100nm 5030CH MoCl5, 99% 5220DX Nb2O5, 99.9%, 500nm 5221DX NbC, -100/+270 mesh 5390DX NdF3, 99.5% 5410SC NiO, 99.9%, 50nm 5911DX Pr6O11, 99.9%, 3-5um 5910DX Pr6O11, 99.9%, <100nm 5992DX PrF3, 99.99% 6110DX Rb2CO3 99.9% 6111DX RbNO3 99.9% 6113DX RbI 99.9% 6115DX RbOH 99.9% 6116DX Rb2SO4 99.9% 6117DX Rb3PO4 99.9% 6510SH S, 99.99%, <55nm 6610CY Sb2O3, 99.9%, 150nm 6807NM SiO2, 99.5%, 15-20nm, porous 6808NM SiO2, 99.5%, 20nm, non-porous 6809NM SiO2, 98.7%, 10~20nm, non-porous 6811DL SiO2, 99%, 10-30nm, treated with Silane Coupling Agents 6851HN SiO2, 10-20nm, modified with amino group, dispersible 6852HN SiO2, 10-20nm, modified with epoxy group, dispersible 6853HN SiO2, 10-20nm, modified with double bond, dispersible 6861HN SiO2, 10-20nm, surface modified with double layer, dispersible 6862HN SiO2, 10-20nm, surface modified, super-hydrophobic & oleophilic, dispersible 6863HN SiO2, 99.8%, 5-15nm, surface modified, hydrophobic & oleophilic, dispersible 6864HN SiO2, 99.8%, 10-25nm, surface modified, super-hydrophobic, dispersible 6820HK SiC, beta, 99%, 40nm 6880XH SiC, beta, whisker, 99+% 6830HK Si3N4, amorphous, 99%, 20nm 6835HM Si3N4, 99.5%, 0.5-1.0um 6835HK Si3N4 alpha, 97.5-99%, fiber, 100nmX800nm 6911DX Sm2O3, 99.9%,3-5 micron 6910DX Sm2O3, 99.9%, <100nm 7012LC SnO2, 99.9%, 50-70nm 7012DX Sc2O3, 99.99%, 3-5um 7050NH ATO, SnO2:Sb2O3=90:10, 40nm 7191DX SrCO3, 99.9%, <500nm 7340DX Ta2O5, 99.99%, <1 micron 7411DX Tb4O7, 99.9%, 3-5um 7511DX Tm2O3, 99.9%, 3-5um 7910DL TiO2 anatase, 99.5%, 10-30 nm 7930DL TiO2 anatase, 99.9%, 5 nm 7920SCDL TiO2, Rutile, Silane Coated, 99.5%, 10~30nm 7918DL TiO2 anatase + Rutile, 99.5%,10-30nm 7920DL TiO2 Rutile, 99.5%, 10-30nm 7921DL TiO2 Rutile coated with SiO2, 99%, 20~40nm 7940HK TiC, 99%, 40nm 7945HK TiN, 97+%, 20nm 8010CN WO3, 99.5%, <100nm 8020CH WS2, 99.9%, 0.8um 8005DX WC, 99.95%, 80nm 8170DX VC, 99+%, -100/+270mesh 8210CG Y2O3, 99.995%, 30-50nm 8211CG Y2O3, 99.995%, 0.5-1.0um 8212CG Y2O3, 99.995%, 1.0-2.0um 8223CG Y2O3, 99.999%, 3.0um 8290DX YF3, 99.9% 8310DX YbF3, 99.9%, 3-5um 8311DX Yb2O3, 99.9%, 3-5um 8410DL ZnO, 99.8%, <30nm 8411DL ZnO, 99%, 10-30nm, treated with silane coupling agents 8415CY ZnO, 99.8%, 200nm 8416DX ZnO, ultra high purity 99.999% 8418DX ZnO ( Al2O3 doped), 40nm 8501YS ZrO2, 99.9%, 1-3um 8503DX ZrO2 in water, 2~5nm 8512QI ZrO2, 99.9%, 20-30nm 8520DL ZrO2-3Y, 99.9%, 0.3-0.5um 8522QI ZrO2- 3Y, 25nm 8528QI ZrO2- 5Y, 20-30nm 8531DL ZrO2- 8Y, 0.8um 8532QI ZrO2- 8Y, 20nm 8540HK ZrC, 97+%, 60nm |
